Hiroki Kawada
Senior Engineer at Hitachi High-Technologies Corp
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Author
Publications (51)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Edge detection, Metrology, Optical lithography, Image processing, Scanning electron microscopy, Transmission electron microscopy, Ion beams, Line width roughness, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Ultraviolet radiation, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

SPIE Journal Paper | 8 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Edge detection, Semiconductors, Metrology, Ion beams, Electron microscopes, Line edge roughness, Transmission electron microscopy

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Edge detection, Metrology, Fin field effect transistors, Denoising, Transmission electron microscopy, Extreme ultraviolet, Line width roughness, Line edge roughness

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Manufacturing, Scanning electron microscopy, Transmission electron microscopy, Atomic layer deposition, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 51 publications
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