Hiroki Miyai
at Lasertec Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 25 November 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Inspection, Image resolution, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Multilayers, Lithographic illumination, Defect detection, Light scattering, Inspection, CCD cameras, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Lithographic illumination, Defect detection, Data modeling, Inspection, Ray tracing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Defect detection, Light scattering, Inspection, Reflectivity, Interference (communication), Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Prototyping

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Mirrors, Manufacturing, Inspection, Ray tracing, Photomasks, Extreme ultraviolet, Image classification, Extreme ultraviolet lithography, Geometrical optics

Showing 5 of 11 publications
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