Hiroki Tanaka
at Oji Holdings Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 4 June 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Antireflective coatings, Etching, Silicon, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip, Photoresist developing

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Carbon, Optical lithography, Etching, Image processing, Scanning electron microscopy, Extreme ultraviolet, Logic devices, Reactive ion etching, Semiconducting wafers, System on a chip

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