Dr. Hiroki Yamamoto
Researcher at National Institute for Quantum & Radiological Science
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Thin films, Electron beams, Silicon, Scanning electron microscopy, Silicon films, Extreme ultraviolet

SPIE Journal Paper | 12 December 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Absorption, Photoresist materials, Photons, Extreme ultraviolet, Electrons, Optical lithography, Chemically amplified resists, Extreme ultraviolet lithography, Photoresist developing, Metals

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Oxides, Nanoparticles, Polymers, Metals, Diffusion, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Stochastic processes, Chemically amplified resists

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Polymers, Metals, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Yield improvement, Photoresist developing, Absorption

Showing 5 of 30 publications
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