Dr. Hiroko Nakamura Profile

Dr. Hiroko Nakamura

at Toshiba Corp

SPIE Involvement:

Author

Publications (11)

SPIE Journal Paper | 1 January 2010

Ion implantation as insoluble treatment for resist-stacking process

Hiroko Nakamura, Takeshi Shibata, Katsumi Rikimaru, Sanae Ito, Satoshi Tanaka, Soichi Inoue

JM3, Vol. 9, Issue 01, 013020, (January 2010) https://doi.org/10.1117/12.10.1117/1.3302123

KEYWORDS: Ions, Ion implantation, Photoresist processing, System on a chip, Optical lithography, Double patterning technology, Etching, Antireflective coatings, Scanning electron microscopy, Photomasks

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SPIE Journal Paper | 1 October 2008

Ultralow k₁ oxide contact hole formation and metal filling using resist contact hole pattern by double line and space formation method

Hiroko Nakamura, Mitsuhiro Omura, Souichi Yamashita, Yasuyuki Taniguchi, Junko Abe, Satoshi Tanaka, Soichi Inoue

JM3, Vol. 7, Issue 04, 043001, (October 2008) https://doi.org/10.1117/12.10.1117/1.2990735

KEYWORDS: Metals, Oxides, Scanning electron microscopy, Copper, Photoresist processing, Optical lithography, Etching, Double patterning technology, System on a chip, Immersion lithography

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Proceedings Article | 26 March 2008 Paper

Ion implantation as insoluble treatment for resist stacking process

Hiroko Nakamura, Takeshi Shibata, Katsumi Rikimaru, Sanae Ito, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 6923, 692322 (2008) https://doi.org/10.1117/12.771811

KEYWORDS: Ions, Ion implantation, Optical lithography, System on a chip, Photoresist processing, Double patterning technology, Etching, Tin, Selenium, Scanning electron microscopy

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Proceedings Article | 26 March 2007 Paper

Ultra-low k₁ oxide contact hole formation and metal filling using resist contact hole pattern by double L&S formation method

Hiroko Nakamura, Mitsuhiro Omura, Souichi Yamashita, Yasuyuki Taniguchi, Junko Abe, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 6520, 65201E (2007) https://doi.org/10.1117/12.709133

KEYWORDS: Metals, Oxides, Scanning electron microscopy, Copper, Optical lithography, Etching, Photoresist processing, Double patterning technology, System on a chip, Semiconducting wafers

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SPIE Journal Paper | 1 April 2005

Contact hole formation by multiple exposure technique in ultralow k₁ lithography

Hiroko Nakamura, Yasunobu Onishi, Kazuya Sato, Satoshi Tanaka, Shoji Mimotogi, Koji Hashimoto, Soichi Inoue

JM3, Vol. 4, Issue 02, 023005, (April 2005) https://doi.org/10.1117/12.10.1117/1.1899324

KEYWORDS: Photomasks, Double patterning technology, Optical lithography, Photoresist processing, Scanning electron microscopy, Phase shifts, Lithographic illumination, Lithography, Semiconducting wafers, Scanners

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Proceedings Article | 28 May 2004 Paper

Contact hole formation by multiple exposure technique in ultralow k1 lithography

Hiroko Nakamura, Yasunobu Onishi, Kazuya Sato, Satoshi Tanaka, Shoji Mimotogi, Koji Hashimoto, Soichi Inoue

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535114

KEYWORDS: Photomasks, Double patterning technology, Optical lithography, Scanning electron microscopy, Lithographic illumination, Lithography, Semiconducting wafers, Photoresist processing, Phase shifts, Scanners

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Proceedings Article | 24 August 2001 Paper

Dissolution performance of device pattern with low-impact development

Shinichi Ito, Kei Hayasaki, Hiroko Nakamura

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436900

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Video, Cameras, Lithography, CCD cameras, Curtains, Photoresist processing, Process engineering, Manufacturing

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Proceedings Article | 28 July 1997 Paper

Focused-ion-beam (FIB) etching of quartz and carbon for Levenson mask repair

Hiroko Nakamura, Haruki Komano, Iwao Higashikawa

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277284

KEYWORDS: Etching, Transmittance, Sputter deposition, Gallium, Phase shifts, Laser processing, Ions, Quartz, Photomasks, Carbon

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Proceedings Article | 24 July 1996 Paper

Focused ion-beam imaging of defects on deep-UV single-layer halftone masks

Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, T. Koike, Iwao Higashikawa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245222

KEYWORDS: Image filtering, Halftones, Digital filtering, Deep ultraviolet, Ion beams, Transmittance, Optical filters, Silicon, Chromium, Quartz

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Proceedings Article | 7 June 1996 Paper

Practical topography design for alternating phase-shifting mask

Satoshi Tanaka, Hiroko Nakamura, Kenji Kawano, Soichi Inoue

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240919

KEYWORDS: Photomasks, Phase shifts, Etching, Polarization, Maxwell's equations, Semiconducting wafers, Light scattering, Opacity, Structural design, Diffraction

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Proceedings Article | 27 May 1996 Paper

Silicon oxide deposition using a gallium-focused ion beam

Haruki Komano, Hiroko Nakamura, Mitsuyo Kariya, Munehiro Ogasawara

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240495

KEYWORDS: Silicon, Oxides, Ion beams, Oxygen, Silicon films, Tungsten, Gold, Electrodes, Ultrasound-modulated optical tomography, Gallium

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Showing 5 of 11 publications

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