Hiromasa Yamanashi
at ASET
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Sputter deposition, Particles, Interfaces, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Argon, Chemical species, Sputter deposition, Interfaces, Silicon, Reflectivity, Transmission electron microscopy, Ion beams, Extreme ultraviolet, Molybdenum

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Carbon, Contamination, Silicon, Hydrogen, Reflectivity, Optical testing, Thermal effects, Extreme ultraviolet, Synchrotron radiation, Protactinium

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Multilayers, Deep ultraviolet, Etching, Silicon, Reflectivity, Chromium, Photomasks, Extreme ultraviolet lithography, Ruthenium, Defect inspection

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Optical spheres, Particles, Silicon, Inspection, Surface roughness, Interference (communication), Photonics, Photomasks, Extreme ultraviolet lithography, Particle systems

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Diamond machining, Etching, Dry etching, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Plasma

Showing 5 of 25 publications
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