Hiromi Hoshino
at Fujitsu Semiconductor Ltd
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Mirrors, Logic, Lithium, Metals, Logic devices, High volume manufacturing, Analog electronics, Electron beam direct write lithography, Semiconducting wafers, System on a chip

SPIE Journal Paper | August 7, 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Information fusion, Semiconductors, Logic, Logic devices, High volume manufacturing, Chemical elements, Analog electronics, Multiplexers, Electron beam direct write lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Metals, Control systems, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beams, Logic, Modulation, Backscatter, Scattering, Laser scattering, Photomasks, Critical dimension metrology, Electron beam direct write lithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Optical lithography, Diffusion, Manufacturing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Photoresist processing, Beam analyzers, Chemically amplified resists

Showing 5 of 12 publications
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