Hiromitsu Mashita
at KIOXIA Corp
SPIE Involvement:
Publications (14)

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11328, 1132806 (2020) https://doi.org/10.1117/12.2557847
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Bridges, Data analysis, Semiconducting wafers, Resolution enhancement technologies, SRAF

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530G (2014) https://doi.org/10.1117/12.2046272
KEYWORDS: Lithography, Neodymium, Optical proximity correction, SRAF, Photomasks, Surface conduction electron emitter displays, Semiconductors, Critical dimension metrology, Image processing, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83221N (2012) https://doi.org/10.1117/12.916129
KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Optical lithography, Model-based design, Computer simulations, Data corrections

Proceedings Article | 20 May 2011 Paper
Proceedings Volume 8081, 80810Q (2011) https://doi.org/10.1117/12.899899
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Opacity, Inspection, Lithography, Binary data, Scanning electron microscopy, Defect detection, Phase shifts

Proceedings Article | 26 May 2010 Paper
Proceedings Volume 7748, 77480S (2010) https://doi.org/10.1117/12.868940
KEYWORDS: Optical lithography, Photomasks, Lithography, Etching, Critical dimension metrology, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Design for manufacturability, Deposition processes

Showing 5 of 14 publications
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