Hiromitsu Mashita
at Toshiba Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 28 March 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Semiconductors, Lithography, Image processing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Neodymium, Semiconducting wafers, Surface conduction electron emitter displays

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Optical lithography, Computer simulations, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Data corrections, Model-based design

Proceedings Article | 20 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Defect detection, Opacity, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 26 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Optical lithography, Etching, Design for manufacturing, Photomasks, Optical proximity correction, Deposition processes, Critical dimension metrology, Semiconducting wafers, Design for manufacturability

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Point spread functions, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Convolution, Critical dimension metrology, Semiconducting wafers

Showing 5 of 13 publications
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