Mr. Hiromu Inoue Profile

Hiromu Inoue

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 23 October 2015 Paper

DUV inspection tool application for beyond optical resolution limit pattern

Hiromu Inoue, Nobutaka Kikuiri, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Takashi Hirano, Ryoji Yoshikawa

Proceedings Volume 9635, 96350R (2015) https://doi.org/10.1117/12.2197890

KEYWORDS: Inspection, Deep ultraviolet, Optical inspection, Photomasks, Nanoimprint lithography, Optical resolution, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection

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Proceedings Article | 6 December 2004 Paper

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Toru Tojo, Ryoich Hirano, Hideo Tsuchiya, Junji Oaki, Takeshi Nishizaka, Yasushi Sanada, Kazuto Matsuki, Ikunao Isomura, Riki Ogawa, Noboru Kobayashi, Kazuhiro Nakashima, Shinji Sugihara, Hiromu Inoue, Shinichi Imai, Hitoshi Suzuki, Akihiko Sekine, Makoto Taya, Akemi Miwa, Nobuyuki Yoshioka, Katsumi Ohira, Dong-Hoon Chung, Masao Otaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579133

KEYWORDS: Inspection, Photomasks, Sensors, Image sensors, Defect detection, Algorithm development, Speckle, Modulation transfer functions, Image processing, Optical inspection

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Proceedings Article | 20 August 2004 Paper

257-nm wavelength mask inspection for 65-nm node reticles

Ryoji Yoshikawa, Hiroyuki Tanizaki, Tomohide Watanabe, Hiromu Inoue, Riki Ogawa, Satoshi Endo, Masami Ikeda, Yoichiro Takahashi, Hidehiro Watanabe

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557725

KEYWORDS: Inspection, Sensors, Photomasks, Image sensors, Reticles, Light sources, Point spread functions, Image processing, Computer aided design, Phase shifting

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Proceedings Article | 1 August 2002 Paper

Detection of half-tone PSM pinhole with DUV reflected light source

Takeshi Fujiwara, Hiromu Inoue, Kentaro Okuda, Takehiko Nomura, Mitsuo Tabata, Satoshi Endo

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476962

KEYWORDS: Inspection, Photomasks, Reflection, Light sources, Signal detection, Sensors, Optical simulations, Image sensors, Image transmission, Deep ultraviolet

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Proceedings Article | 19 July 2000 Paper

Newly developed mask inspection system with DUV laser illumination

Katsuki Oohashi, Hiromu Inoue, Takehiko Nomura, Akira Ono, Mitsuo Tabata, Hitoshi Suzuki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392086

KEYWORDS: Inspection, Photomasks, Phase shifts, Speckle, Deep ultraviolet, Speckle pattern, Sensors, Defect detection, Laser development, Light sources

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Proceedings Article | 30 December 1999 Paper

High-resolution DUV inspection system for 150-nm generation masks

Mitsuo Tabata, Hideo Tsuchiya, Yasushi Sanada, Takeshi Nishizaka, Hiroaki Hirazawa, Noboru Kobayashi, Hideo Nagai, Tomohide Watanabe, Katsuki Oohashi, Hiromu Inoue, Takehiko Nomura, Akira Ono

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373309

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Sensors, Defect detection, Speckle, Image sensors, Ultraviolet radiation, Signal detection, Phase shifts

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Proceedings Article | 28 July 1997 Paper

New die-to-database mask inspection system with i-line optics for 256-Mbit and 1-Gbit DRAMs

Mitsuo Tabata, Kyoji Yamashita, Hideo Tsuchiya, Takehiko Nomura, Hiromu Inoue, Tomohide Watanabe, Toru Tojo, Hisakazu Yoshino

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277266

KEYWORDS: Inspection, Photomasks, Image sensors, Image processing, Sensors, Defect inspection, Data processing, Defect detection, Binary data, Image resolution

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Proceedings Article | 28 July 1997 Paper

Image sensing method and defect detection algorithm for a 256-Mbit and 1-Gbit DRAM mask inspection system

Hiromu Inoue, Kentaro Okuda, Takehiko Nomura, Hideo Tsuchiya, Mitsuo Tabata

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277286

KEYWORDS: Defect detection, Sensors, Inspection, Photomasks, Image sensors, Sensing systems, Algorithm development, Detection and tracking algorithms, Computer aided design, Calibration

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Showing 5 of 8 publications

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