Dr. Hironobu Yabuta
at Ushio Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 5 May 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Mirrors, Sputter deposition, Reliability, Laser development, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Plasma

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Ions, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Plasma, Tin

Proceedings Article | 19 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Feedback control, Ruthenium, Plasma, Tin

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Electrodes, Reliability, Inspection, Laser stabilization, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Mirrors, Contamination, Sputter deposition, Scanners, Particles, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Tin

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Mirrors, Electrodes, Reflectivity, Magnetism, Xenon, Extreme ultraviolet, Halogens, Ruthenium, Plasma, Tin

Showing 5 of 7 publications
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