Dr. Hironori Asada
at Yamaguchi Univ
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Polymethylmethacrylate, Argon, Chemical species, Dry etching, Resistance, Scanning electron microscopy, Photomasks, Chlorine, Photoresist processing

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electron beams, Polymethylmethacrylate, Polymers, Resistance, Scanning electron microscopy, Photomasks, Photoresist processing, Halogens, Photomask technology

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Electron beams, Dry etching, Polymers, Scanning electron microscopy, Photomasks, Line width roughness, Nanoimprint lithography, Line edge roughness, Photoresist processing

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Electron beams, Etching, Dry etching, Polymers, Resistance, Scanning electron microscopy, Photomasks, Line width roughness, Line edge roughness, Plasma

Showing 5 of 6 publications
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