Hironori Ikezawa
at Nikon Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Actuators, Reticles, Calibration, Scanners, Wavefronts, Control systems, Deformable mirrors, Distortion, Feedback control, Automatic control

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Mirrors, Optical lithography, Wavefronts, Control systems, Deformable mirrors, Distortion, Projection systems, Performance modeling, Overlay metrology

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Imaging systems, Scanners, Wavefronts, Control systems, Line width roughness, Double patterning technology, Optical proximity correction

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Wafer-level optics, Monochromatic aberrations, Mirrors, Polarization, Wavefronts, Projection systems, Semiconducting wafers, Refractor telescopes, Combined lens-mirror systems, Resolution enhancement technologies

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