Prof. Hiroo Kinoshita
at Univ of Hyogo
SPIE Involvement:
Author
Publications (54)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Contamination, Metals, Germanium, Silicon, Hydrogen, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Chemical elements, Zirconium

SPIE Journal Paper | February 18, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

PROCEEDINGS ARTICLE | November 9, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Phase contrast, Reflection, CCD cameras, Phase imaging, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reconstruction algorithms

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Multilayers, Switching, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Spherical lenses

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Microscopes, Diffraction, Mirrors, CCD cameras, Scatterometry, 3D metrology, Relays, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Chemical species, Electrons, Silicon, Coating, Transmittance, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Hybrid fiber optics, Absorption

Showing 5 of 54 publications
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