Prof. Hiroo Kinoshita
at Univ of Hyogo
SPIE Involvement:
Author
Publications (54)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Hydrogen, Chemical elements, Mirrors, Reflectivity, Zirconium, Aluminum, Silicon, Germanium

SPIE Journal Paper | 18 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

Proceedings Article | 9 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Microscopes, Extreme ultraviolet, Phase contrast, Phase imaging, Extreme ultraviolet lithography, Coherence imaging, Diffraction, Photomasks, CCD cameras, Reconstruction algorithms, Reflection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Reflectometry, Mirrors, Extreme ultraviolet, Reflectivity, Photomasks, Spherical lenses, Switching, Multilayers, Extreme ultraviolet lithography, Synchrotrons

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Extreme ultraviolet, Diffraction, Photomasks, Mirrors, Extreme ultraviolet lithography, Microscopes, 3D metrology, CCD cameras, Relays, Scatterometry

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Transmittance, Extreme ultraviolet, Absorption, Coating, Hybrid fiber optics, Extreme ultraviolet lithography, Electrons, Absorbance, Chemical species, Silicon

Showing 5 of 54 publications
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