Mr. Hiroshi Arima Profile

Hiroshi Arima

at Tokyo Electron Kyushu Ltd

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Author

Publications (3)

Proceedings Article | 1 April 2009 Paper

Study of residue type defect formation mechanism and the effect of advanced defect reduction (ADR) rinse process

Hiroshi Arima, Yuichi Yoshida, Kosuke Yoshihara, Tsuyoshi Shibata, Yuki Kushida, Hiroki Nakagawa, Yukio Nishimura, Yoshikazu Yamaguchi

Proceedings Volume 7273, 727333 (2009) https://doi.org/10.1117/12.814034

KEYWORDS: Polymers, Photoresist processing, Image processing, Materials processing, Semiconducting wafers, Photoresist developing, Lithography, Photomasks, Dynamic light scattering, Photoresist materials

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Proceedings Article | 1 April 2009 Paper

Non-topcoat process development for ArF immersion lithography

Takehiko Naruoka, Nobuji Matsumura, Akimasa Soyano, Shiro Kusumoto, Yoshikazu Yamaguchi, Hiroshi Arima, Yuichi Yoshida, Kousuke Yoshihara, Tsuyoshi Shibata

Proceedings Volume 7273, 727328 (2009) https://doi.org/10.1117/12.814084

KEYWORDS: Surface properties, Water, Immersion lithography, Lithography, Photoresist processing, Thin film coatings, Semiconducting wafers, Defect inspection, Coating, Line width roughness

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Proceedings Article | 4 April 2008 Paper

Process development for high scan speed ArF immersion lithography

Nobuji Matsumura, Norihiko Sugie, Kentaro Goto, Koichi Fujiwara, Yoshikazu Yamaguchi, Hirokazu Tanizaki, Katsushi Nakano, Tomoharu Fujiwara, Shinya Wakamizu, Hirofumi Takeguchi, Hiroshi Arima, Hideharu Kyoda, Kosuke Yoshihara, Junichi Kitano

Proceedings Volume 6923, 69230D (2008) https://doi.org/10.1117/12.771795

KEYWORDS: Lithography, Immersion lithography, Thin film coatings, 193nm lithography, Semiconducting wafers, Bridges, Defect inspection, Photoresist processing, Line width roughness, Semiconductors

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