Hiroshi Arima
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Water, Coating, Surface properties, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Image processing, Materials processing, Dynamic light scattering, Photoresist materials, Photomasks, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Bridges, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, 193nm lithography, Defect inspection

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