Dr. Hiroshi Arimoto
at Fujitsu Semiconductor Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Electron beam lithography, Etching, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Failure analysis, Back end of line

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Metrology, Image processing, Silicon, Process control, Photomasks, Mask making, Optical alignment, Reactive ion etching, Photoresist processing, Semiconducting wafers

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Optical lithography, Scattering, Etching, Silicon, Image resolution, Photomasks, Mask making, Reactive ion etching, Semiconducting wafers

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Metrology, Etching, Image processing, 3D modeling, Photomasks, Mask making, Picosecond phenomena, Silicon carbide, Projection lithography

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Etching, Inspection, Printing, Ion beams, Image transmission, Photomasks, Raster graphics, Photomicroscopy, Semiconducting wafers, Defect inspection

Showing 5 of 12 publications
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