Hiroshi Fujita
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 22 April 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Sensors, Quartz, Silicon, Image resolution, Photomasks, Semiconducting wafers, Signal detection, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Fabrication, Quartz, Chromium, Scanning electron microscopy, Photomasks, Double patterning technology, Nanoimprint lithography, Optical alignment, Neodymium, Nanolithography

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Metrology, Data modeling, Silicon, Distortion, Printing, Photomasks, Mask making, Semiconducting wafers, Data corrections

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Error analysis, Silicon, Distortion, Image analysis, Photomasks, Electron beam direct write lithography, Semiconducting wafers, Charged-particle lithography

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Etching, Silicon, Manufacturing, Printing, Photomasks, Semiconducting wafers, Projection lithography

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Silicon, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Charged-particle lithography, Holons

Showing 5 of 21 publications
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