Dr. Hiroshi Fukuda
Chief Engineer at Hitachi High-Technologies Corp
SPIE Involvement:
Senior status | Conference Program Committee | Journal Editorial Board Member | Author
Publications (26)

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Edge detection, Metrology, Spatial frequencies, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Signal detection, Edge roughness

PROCEEDINGS ARTICLE | April 12, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Silicon, Inspection, Scanning electron microscopy, Silicon films, Extreme ultraviolet, Extreme ultraviolet lithography, Analytical research, Line edge roughness

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Potassium, FT-IR spectroscopy, Etching, Polymers, Silicon, Inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Argon, Glasses, Silicon, Silicon films, Absorbance, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Cadmium, Inspection, Monte Carlo methods, Photomasks, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Electron beams, Etching, Polymers, Ions, Silicon, Inspection, Scanning electron microscopy, Line edge roughness, Semiconducting wafers

Showing 5 of 26 publications
Conference Committee Involvement (1)
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
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