Dr. Hiroshi Fukuda
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Publications (35)

SPIE Journal Paper | 12 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Stochastic processes, Monte Carlo methods, Polymers, Diffusion, Absorption, Extreme ultraviolet lithography, Extreme ultraviolet, Selenium, Photon transport, Photomasks

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Polymers, Diffusion, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Absorption, Chemically amplified resists

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Inspection, Optical inspection, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Chemical reactions, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Ranging

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Genetic algorithms, Computer simulations, Monte Carlo methods, Extreme ultraviolet lithography, Optimization (mathematics), Stochastic processes

SPIE Journal Paper | 3 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

Showing 5 of 35 publications
Conference Committee Involvement (1)
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
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