Dr. Hiroshi Fukuda
Chief Engineer at Hitachi High-Technologies Corp
SPIE Involvement:
Senior status | Conference Program Committee | Journal Editorial Board Member | Author
Publications (28)

SPIE Journal Paper | July 23, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Edge detection, Metrology, Detection and tracking algorithms, Reliability, Scanning electron microscopy, Process control, Image filtering, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Edge detection, Metrology, Spatial frequencies, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Signal detection, Edge roughness

PROCEEDINGS ARTICLE | April 12, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Silicon, Inspection, Scanning electron microscopy, Silicon films, Extreme ultraviolet, Extreme ultraviolet lithography, Analytical research, Line edge roughness

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Potassium, FT-IR spectroscopy, Etching, Polymers, Silicon, Inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Argon, Glasses, Silicon, Silicon films, Absorbance, Line edge roughness, Semiconducting wafers

Showing 5 of 28 publications
Conference Committee Involvement (1)
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
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