Dr. Hiroshi Matsumoto
Chief Specialist & Deputy Manager at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Photomasks, Extreme ultraviolet, Photoresist processing, Electron beam lithography, Electron beams

SPIE Journal Paper | 24 September 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Modulation, Photomasks, Optical lithography, Critical dimension metrology, Image resolution, Line edge roughness, Photoresist processing, Electron beam lithography, Vestigial sideband modulation, Convolution

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Electron beam lithography, Electron beams

Proceedings Article | 5 April 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Modulation, Photomasks, Photoresist processing, Electron beam lithography, Optical lithography, Image resolution, Electron beams, Beam shaping, Vestigial sideband modulation, Convolution

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

Showing 5 of 11 publications
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