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Hiroshi Miroku
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Publications (1)
Proceedings Article | 8 April 2019 Paper
Macro CDSEM 2D metrology supporting advanced DRAM patterning
R. Kris, G. Klebanov, I. Schwarzband, E. Sommer, L. Gershtein, B. Mathew, E. Noifeld, S. Levy, R. Alkoken, O. Novak, H. Miroku, D. Rathore , S. Pastur, S. Duvdevani-Bar, T. Bar-On, I. Horikawa
Proceedings Volume 10959, 109592S (2019) https://doi.org/10.1117/12.2515233
KEYWORDS: Metrology, Critical dimension metrology, Process control, Scanning electron microscopy, Optical lithography, Algorithm development, Detection and tracking algorithms, Mathematical modeling, Image enhancement, Computer aided design
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