Dr. Hiroshi Nomura Profile

Dr. Hiroshi Nomura

at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 23 March 2011 Paper

Physical conversion of Stokes parameters which are multiplied by a general Mueller matrix into Jones vectors applicable to the lithographic calculation

Hiroshi Nomura, Masanori Takahashi, Suigen Kyoh

Proceedings Volume 7973, 79731O (2011) https://doi.org/10.1117/12.879338

KEYWORDS: Polarization, Lithography, Lithographic illumination, Jones vectors, Polarimetry, Mueller matrices, Jones calculus, Jones matrices, Calculus, Polarizers

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Proceedings Article | 4 March 2010 Paper

In-situ Mueller matrix polarimetry of projection lenses for 193-nm lithography

Hiroshi Nomura, Iwao Higashikawa

Proceedings Volume 7640, 76400Q (2010) https://doi.org/10.1117/12.845973

KEYWORDS: Polarimetry, Photomasks, Polarization, Lithography, Polarizers, Semiconducting wafers, Lithographic illumination, Lenses, Mueller matrices, Wafer-level optics

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Proceedings Article | 11 December 2009 Paper

Mueller matrix polarimetry for immersion lithography tools with a polarization monitoring system at the wafer plane

Hiroshi Nomura, Iwao Higashikawa

Proceedings Volume 7520, 752012 (2009) https://doi.org/10.1117/12.837031

KEYWORDS: Polarimetry, Polarization, Semiconducting wafers, Photomasks, Polarizers, Immersion lithography, Lithography, Lithographic illumination, Optical components, Calcite

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Proceedings Article | 12 March 2008 Paper

In-situ polarimetry of illumination for 193-nm lithography

Hiroshi Nomura, Yohko Furutono

Proceedings Volume 6924, 69241T (2008) https://doi.org/10.1117/12.771329

KEYWORDS: Polarization, Polarimetry, Photomasks, Image sensors, Lithographic illumination, Polarizers, Scanners, Crystals, Lithography, Sapphire

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Proceedings Article | 28 November 2007 Paper

Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs

Hiroshi Nomura, Yohko Furutono

Proceedings Volume 6834, 683408 (2007) https://doi.org/10.1117/12.753845

KEYWORDS: Polarimetry, Polarization, Polarizers, Photomasks, Lithographic illumination, Crystals, Lithography, Image sensors, Refractive index, Projection systems

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Proceedings Article | 14 September 2001 Paper

New phase-shift gratings for measuring aberrations

Hiroshi Nomura

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435738

KEYWORDS: Reticles, Monochromatic aberrations, Diffraction gratings, Opacity, Diffraction, Krypton, Excimer lasers, Laser scanners, 3D scanning, Overlay metrology

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Proceedings Article | 26 July 1999 Paper

Higher-order aberration measurement with printed patterns under extremely reduced sigma illumination

Hiroshi Nomura, Kazuo Tawarayama, Takuya Kohno

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354348

KEYWORDS: Monochromatic aberrations, Zernike polynomials, Semiconducting wafers, Inspection, Lithography, Lithographic illumination, Overlay metrology, Excimer lasers, Laser scanners, 3D scanning

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Proceedings Article | 8 June 1998 Paper

Overlay error due to lens coma and asymmetric illumination dependence on pattern features

Hiroshi Nomura, Takashi Sato

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308728

KEYWORDS: Monochromatic aberrations, Inspection, Wavefronts, Overlay metrology, Zernike polynomials, Projection systems, Reticles, Error analysis, Illumination engineering, Process engineering

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