Dr. Hiroshi Sakaue
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Metrology, Etching, Image processing, 3D modeling, Photomasks, Mask making, Picosecond phenomena, Silicon carbide, Projection lithography

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Metrology, Image processing, Silicon, Process control, Photomasks, Mask making, Optical alignment, Reactive ion etching, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Reticles, Metrology, Silicon, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Overlay metrology

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Electron beam lithography, Metals, Scanners, Copper, Resistance, Scanning electron microscopy, Transmission electron microscopy, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Electron beam lithography, Reticles, Metrology, Silicon, Distortion, Time metrology, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Metals, Copper, Photography, Resistance, Distortion, Photomasks, Overlay metrology

Showing 5 of 8 publications
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