Dr. Hiroshi Sakaue
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Metrology, Etching, Image processing, 3D modeling, Photomasks, Mask making, Picosecond phenomena, Silicon carbide, Projection lithography

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Metrology, Image processing, Silicon, Process control, Photomasks, Mask making, Optical alignment, Reactive ion etching, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Reticles, Metrology, Silicon, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Overlay metrology

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Electron beam lithography, Metals, Scanners, Copper, Resistance, Scanning electron microscopy, Transmission electron microscopy, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Electron beam lithography, Reticles, Metrology, Silicon, Distortion, Time metrology, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top