Hiroshi Tanaka
at Gigaphoton Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Semiconductors, Mirrors, Reflectivity

Proceedings Article | 6 June 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Mirrors, Light sources, Ions, Laser development, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 12 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Semiconductors, Lithography, Mirrors, Light sources, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Actuators, Diffraction, Light sources, Oscillators, Electrodes, Laser applications, Laser stabilization, Immersion lithography, Semiconducting wafers, Diffraction gratings

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Mirrors, Light sources, Laser development, Magnetism, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Plasma, Tin

Showing 5 of 18 publications
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