Dr. Hirotaka Tsuda
at Toshiba Memory Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 23 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Nanotechnology, Lithography, Etching, Manufacturing, Process control, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Photoresist processing

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Design for manufacturing, Source mask optimization, Optical proximity correction, High volume manufacturing, Nanoimprint lithography, Photoresist processing, Process modeling

Proceedings Article | 31 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Nanotechnology, Lithography, Optical microscopes, Optical lithography, Ultraviolet radiation, Design for manufacturing, Artificial intelligence, Double patterning technology, Nanoimprint lithography, Photoresist processing, Scatter measurement, Nanolithography, UV optics, Design for manufacturability

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Image processing, Manufacturing, Control systems, Scatterometry, Process control, Photomasks, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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