Dr. Hiroyoshi Tanabe Profile

Dr. Hiroyoshi Tanabe

Researcher at Tokyo Institute of Technology

SPIE Involvement:

Author

Publications (38)

SPIE Journal Paper | 2 January 2024 Open Access

Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

JM3, Vol. 23, Issue 01, 014201, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014201

KEYWORDS: 3D modeling, 3D mask effects, Diffraction, Extreme ultraviolet lithography, Light sources and illumination, Waveguides, Waveguide modes, Wave equations, Extreme ultraviolet, Fourier transforms

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Proceedings Article | 21 November 2023 Presentation + Paper

Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12750, 127500D (2023) https://doi.org/10.1117/12.2688029

KEYWORDS: Photomasks, 3D modeling, Diffraction, Extreme ultraviolet lithography, Waveguides, Waveguide modes, Light sources and illumination, Extreme ultraviolet, Wave equations, Dielectric polarization

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SPIE Journal Paper | 15 June 2023 Open Access

Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

JM3, Vol. 22, Issue 02, 024201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024201

KEYWORDS: Education and training, Metals, Diffraction, 3D mask effects, Optical proximity correction, Fourier transforms, Convolutional neural networks, Extreme ultraviolet, Cadmium, Extreme ultraviolet lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns

Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi

Proceedings Volume 12495, 124951J (2023) https://doi.org/10.1117/12.2659063

KEYWORDS: 3D mask effects, Optical proximity correction, 3D modeling, Diffraction, Extreme ultraviolet lithography, Convolutional neural networks

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SPIE Journal Paper | 14 October 2022 Open Access

Data augmentation in extreme ultraviolet lithography simulation using convolutional neural network

Hiroyoshi Tanabe, Atsushi Takahashi

JM3, Vol. 21, Issue 04, 041602, (October 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041602

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, 3D modeling, Fourier transforms, Cadmium, Convolutional neural networks, Semiconducting wafers, Optical proximity correction, Extreme ultraviolet

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Proceedings Article | 26 May 2022 Presentation + Paper

Data augmentation in EUV lithography simulation based on convolutional neural network

Hiroyoshi Tanabe, Atsushi Takahashi

Proceedings Volume 12052, 120520T (2022) https://doi.org/10.1117/12.2615267

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, 3D modeling, Fourier transforms, Convolutional neural networks, Semiconducting wafers, Neural networks, Near field, Extreme ultraviolet

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Proceedings Article | 12 October 2021 Presentation + Paper

Classification of EUV masks based on the ratio of the complex refractive index k/(1-n)

Hiroyoshi Tanabe

Proceedings Volume 11854, 1185416 (2021) https://doi.org/10.1117/12.2601875

KEYWORDS: Extreme ultraviolet, Transmittance, Reflectivity, Refractive index, Phase shifts, EUV optics

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SPIE Journal Paper | 24 September 2021

Fast EUV lithography simulation using convolutional neural network

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi

JM3, Vol. 20, Issue 04, 041202, (September 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041202

KEYWORDS: Photomasks, 3D modeling, Diffraction, Polarization, Fourier transforms, Extreme ultraviolet lithography, Convolutional neural networks, Extreme ultraviolet, 3D acquisition, Waveguides

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Proceedings Article | 22 February 2021 Presentation + Paper

Fast 3D lithography simulation by convolutional neural network

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi

Proceedings Volume 11614, 116140M (2021) https://doi.org/10.1117/12.2583683

KEYWORDS: Photomasks, Convolutional neural networks, 3D modeling, Systems modeling, Lithography, Waveguides, Electromagnetic simulation, Polarization, Finite-difference time-domain method, Extreme ultraviolet

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Proceedings Article | 20 September 2020 Presentation + Paper

Fast 3D lithography simulation by convolutional neural network: POC study

Hiroyoshi Tanabe, Shimpei Sato, Atsushi Takahashi

Proceedings Volume 11518, 115180L (2020) https://doi.org/10.1117/12.2575971

KEYWORDS: Photomasks, Convolutional neural networks, Systems modeling, Lithography, 3D modeling, Finite-difference time-domain method, Extreme ultraviolet, Optical lithography, Optical simulations, Fourier transforms

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Proceedings Article | 9 September 2013 Paper

Direct phase-shift measurement of an EUV mask with gradient absorber thickness

Hiroyoshi Tanabe, Tetsunori Murachi, Seh-Jin Park, Eric Gullikson, Tsukasa Abe, Naoya Hayashi

Proceedings Volume 8880, 88801D (2013) https://doi.org/10.1117/12.2031135

KEYWORDS: Extreme ultraviolet, Phase measurement, Photomasks, Reflectivity, Phase shifts, Scattering, Data modeling, Reflectometry, Light scattering, Sensors

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Proceedings Article | 14 October 2011 Paper

Phase-shifting effect of thin-absorber EUV masks

Sang H. Lee, Naoya Hayashi, Taichi Ogase, Hiroyoshi Tanabe, Manish Chandhok, Tetsunori Murachi, Tsukasa Abe, Guojing Zhang, Seh-Jin Park

Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

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Proceedings Article | 8 April 2011 Paper

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Hiroyoshi Tanabe, Todd Younkin, Manish Chandhok, Guojing Zhang, Steve Carson, John Magana, Michael Leeson, Sang Lee

Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

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Proceedings Article | 11 June 2010 Paper

Short-range electron backscattering from EUV masks

Hiroyoshi Tanabe, Naoya Hayashi, Yuichi Inazuki, Tsukasa Abe

Proceedings Volume 7748, 774823 (2010) https://doi.org/10.1117/12.862641

KEYWORDS: Backscatter, Extreme ultraviolet, Photomasks, Monte Carlo methods, Scattering, Extreme ultraviolet lithography, Multilayers, Tantalum, Chromium, Cadmium sulfide

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Proceedings Article | 14 May 2007 Paper

LER transfer from a mask to wafers

Vikram Tolani, Ginga Yoshizawa, Koichiro Kojima, Hiroyoshi Tanabe, Naoya Hayashi, Yan Liu

Proceedings Volume 6607, 66071H (2007) https://doi.org/10.1117/12.728964

KEYWORDS: Line edge roughness, Photomasks, Semiconducting wafers, Line width roughness, Scanning electron microscopy, Spatial frequencies, Light sources, Wafer-level optics, Fourier transforms, Decision support systems

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Proceedings Article | 27 December 2002 Paper

PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes -- ArF, F2, or EPL?

Yoshinori Nagaoka, Hiroyoshi Tanabe

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467903

KEYWORDS: Lithography, Photomasks, Pellicles, Scanners, Phase shifts, Transmittance, Mask making, Semiconducting wafers, Extreme ultraviolet, Particles

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Proceedings Article | 11 March 2002 Paper

PMJ01 panel discussion review: issues on mask technology for 100-nm lithography

Hisatake Sano, Hiroyoshi Tanabe

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458306

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Critical dimension metrology, Transmittance, Inspection, Printing, Defect inspection, Reticles, Phase shifts

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Proceedings Article | 19 July 2000 Paper

Impact of MEF on 0.15-um KrF lithography

Haruo Iwasaki, Hiroyoshi Tanabe

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392042

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Lithography, Binary data, Phase shifts, Cadmium, Excimer lasers, Optical simulations, Transmittance

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Proceedings Article | 5 July 2000 Paper

Influence of resist process on the best focus shift due to lens spherical aberration

Seiji Matsuura, Hiroyoshi Tanabe, Takayuki Uchiyama

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388968

KEYWORDS: Critical dimension metrology, Monochromatic aberrations, Lithography, Neodymium, Photoresist processing, Photomasks, Diffusion, Wavefront aberrations, Phase shifts, Phase measurement

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Proceedings Article | 23 June 2000 Paper

193-nm chemically amplified positive resists based on poly(norbornene-alt-maleic anhydride) with plasticizing additives

Hiroyoshi Tanabe, Hiroshi Yoshino, Toshiro Itani, Michiya Takimoto

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388255

KEYWORDS: Lithography, Chemically amplified resists, Polymers, Temperature metrology, Glasses, Annealing, Scanning electron microscopy, Diffusion, Photomicroscopy, Silicon

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Proceedings Article | 25 August 1999 Paper

Interactive OPC simulator for memory devices

Hirotomo Inui, Haruo Iwasaki, Hiroyoshi Tanabe, Toshiyuki Ohta

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360195

KEYWORDS: Optical proximity correction, Diffusion, Photoresist materials, Chemically amplified resists, Computer simulations, Device simulation, Instrument modeling, Photomasks, 3D modeling, Convolution

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Proceedings Article | 25 August 1999 Paper

Pattern dependence of mask topography effect in alternating phase-shifting masks

Tadao Yasuzato, Hiroyoshi Tanabe, Shinji Ishida

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360218

KEYWORDS: Photomasks, Etching, Phase shifts, Lithography, Quartz, Critical dimension metrology, Binary data, Destructive interference, Light scattering, Mask making

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Proceedings Article | 11 June 1999 Paper

Effects of polymer structure on dissolution characteristics in chemically amplified 193-nm resists

Mitsuharu Yamana, Hiroyoshi Tanabe, Hiroshi Yoshino, Masaharu Takizawa, Toshiro Itani, Kunihiko Kasama

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350214

KEYWORDS: Polymers, Lithography, Resistance, Etching, Diffusion, Silicon, Scanning electron microscopy, Silicon films, 193nm lithography, Lithographic illumination

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Proceedings Article | 18 December 1998 Paper

Optical proximity correction for 0.15-um-rule memory devices

Yoshiyuki Tanaka, Hiroyoshi Tanabe, Takashi Inoue, Haruo Iwasaki

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332838

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Critical dimension metrology, Dry etching, Mask making, Chromium, Etching, Head, Excimer lasers

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Proceedings Article | 18 December 1998 Paper

Inspection of OPC reticle for 0.18-um-rule devices

Hiroyoshi Tanabe, Hiroyuki Shigemura, Yoji Tono-oka, Haruo Iwasaki, Akihiko Ando

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332835

KEYWORDS: Reticles, Inspection, Optical proximity correction, Semiconducting wafers, Defect detection, Defect inspection, Scanners, Lithium, Wafer-level optics, Optical calibration

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Proceedings Article | 1 September 1998 Paper

Subresolution assist feature masks for 0.2-um window pattern formation

Akihiko Andou, Tadao Yasuzato, Hiroyoshi Tanabe, Yoji Tonooka, Tatuya Kamata, Shinji Ishida, Hiroyuki Shigemura

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328824

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Critical dimension metrology, Lithography, Dry etching, Excimer lasers, Defect detection, Photography, Manufacturing

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Proceedings Article | 1 September 1998 Paper

High-transmittance rim-type attenuated phase-shift masks for sub-0.2-um hole patterns

Keiichi Hoshi, Hiroyoshi Tanabe, Haruo Iwasaki

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328842

KEYWORDS: Photomasks, Transmittance, Lithography, Phase shifts, Chromium, Quartz, Opacity, Deep ultraviolet, Scanning electron microscopy, Photography

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Proceedings Article | 29 June 1998 Paper

Compatibility of chemically amplified photoresists with bottom antireflective coatings

Hiroshi Yoshino, Shuichi Hashimoto, Toshiro Itani, Mitsuharu Yamana, Hiroyoshi Tanabe, Tsuyoshi Yoshii

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312459

KEYWORDS: Diffusion, Chemically amplified resists, Semiconducting wafers, Bottom antireflective coatings, Photoresist materials, Silicon, Lithography, Silicon films, Excimer lasers, Reflectivity

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Proceedings Article | 29 June 1998 Paper

Deblocking reaction of chemically amplified ArF positive resists

Toshiro Itani, Mitsuharu Yamana, Kunihiko Kasama, Hiroyoshi Tanabe, Shuichi Hashimoto, Hiroshi Yoshino

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312429

KEYWORDS: Lithography, Polymers, Chemical analysis, Diffusion, Contamination, Temperature metrology, Silicon, Statistical analysis, Absorption, Beryllium

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Proceedings Article | 28 July 1997 Paper

Large assist feature phase-shift mask for sub-quarter-micrometer window pattern formation

Tadao Yasuzato, Kunihiko Kasama, Shinji Ishida, Hiroyoshi Tanabe

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277278

KEYWORDS: Scattering, Photomasks, Phase shifts, Quartz, Excimer lasers, Semiconducting wafers, Lithographic illumination, Lithography, Etching, Light scattering

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Proceedings Article | 7 July 1997 Paper

Optical proximity correction of alternating phase-shift masks for 0.18-um KrF lithography

Tadao Yasuzato, Satomi Shioiri, Kunihiko Kasama, Hiroyoshi Tanabe, Shinji Ishida

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275992

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Phase shifts, Excimer lasers, Monochromatic aberrations

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Proceedings Article | 12 February 1997 Paper

Attenuated phase-shift masks reducing side-lobe effect in DRAM peripheral circuit region

Hiroyoshi Tanabe, Keiichi Hoshi, Haruo Iwasaki, Kunihiko Kasama

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301229

KEYWORDS: Photomasks, Chromium, Phase shifts, Deep ultraviolet, Lithography, Photoresist materials, Electron beams, Binary data, Amplifiers, Mask making

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Proceedings Article | 7 June 1996 Paper

Xe2 excimer lamp (172 nm) for optical lithography

Jun-ichi Yano, Yuko Seki, Yukio Ogura, Jun Ushioda, Hiroyoshi Tanabe

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240967

KEYWORDS: Excimers, Lamps, Photoresist materials, Optical lithography, Excimer lasers, Printing, Lithography, Transmittance, Vacuum ultraviolet, Optical filters

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Proceedings Article | 3 July 1995 Paper

Sub 0.1 um ArF excimer laser lithography with alternating phase-shifting masks

Takeshi Ohfuji, Katsumi Maeda, Jun Ushioda, Hiroyoshi Tanabe, Yukio Ogura, Yuko Seki

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212787

KEYWORDS: Photomasks, Phase shifts, Excimer lasers, Lithography, Transmittance, Quartz, Deep ultraviolet, Etching, Optical lithography, Image resolution

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Proceedings Article | 26 May 1995 Paper

Fast optical proximity correction: analytical method

Satomi Shioiri, Hiroyoshi Tanabe

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209258

KEYWORDS: Optical proximity correction, Reticles, Testing and analysis, Semiconducting wafers, Photomasks, Wafer-level optics, Transmittance, Image segmentation, Optical lithography, Phase shifts

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Proceedings Article | 26 May 1995 Paper

Efficient 3D phase-shifting mask lithography simulation

Hiroyoshi Tanabe, Andrzej Strojwas, Kevin Lucas

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209273

KEYWORDS: 3D modeling, Photomasks, Fused deposition modeling, Imaging systems, Systems modeling, Waveguides, Particles, Lithography, Spatial frequencies, Glasses

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Proceedings Article | 1 June 1992 Paper

Modeling of optical images in resists by vector potentials

Hiroyoshi Tanabe

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130360

KEYWORDS: 3D modeling, Electromagnetism, Dielectrics, Optical lithography, Differential equations, Radio propagation, Magnetism, Maxwell's equations, Wave propagation, Chemical elements

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Proceedings Article | 1 June 1992 Paper

Resolution improvement with annular illumination

Hiroyoshi Tanabe, Hiroshi Nozue, Keiichiro Tounai, Kunihiko Kasama

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130365

KEYWORDS: Spatial frequencies, Optical lithography, Lithographic illumination, Photoresist processing, Lithography, Microscopes, Printing, Light, Light sources, Photomasks

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