Hiroyuki Kurita
Applications Manager at KLA Japan
SPIE Involvement:
Publications (7)

Proceedings Article | 18 April 2013 Paper
Dana Klein, Eran Amit, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Chin-Chou Kevin Huang, Ramkumar Karur-Shanmugam, Bill Pierson, Cindy Kato, Hiroyuki Kurita
Proceedings Volume 8681, 86811J (2013) https://doi.org/10.1117/12.2011454
KEYWORDS: Target detection, Semiconducting wafers, Overlay metrology, Yield improvement, Metrology, Calibration, Error analysis, Semiconductors, Manufacturing, Lithography

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86811G (2013) https://doi.org/10.1117/12.2011416
KEYWORDS: Calibration, Overlay metrology, Metrology, Semiconducting wafers, Optical filters, Neodymium, Time metrology, Process control, Ions, Data modeling

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 79711G (2011) https://doi.org/10.1117/12.879494
KEYWORDS: Overlay metrology, Data modeling, Metrology, Semiconductor manufacturing, Semiconductors, Semiconducting wafers, Process control, Numerical simulations, Data processing, Instrument modeling

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76381R (2010) https://doi.org/10.1117/12.846371
KEYWORDS: Semiconducting wafers, Statistical modeling, Lithography, Overlay metrology, Double patterning technology, Photomasks, Optical lithography, Metrology, Data modeling, Mathematical modeling

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 727206 (2009) https://doi.org/10.1117/12.813568
KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Time metrology, Monte Carlo methods, Optical lithography, Statistical methods, Control systems, Immersion lithography, Lithography

Showing 5 of 7 publications
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