Hiroyuki Miyashita
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (43)

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Metals, Silicon, Transmittance, Photomasks, Excimer lasers, Double patterning technology, Optical proximity correction, Semiconducting wafers, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Opacity, Inspection, Bridges, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, 3D acquisition, Defect detection, Manufacturing, Image analysis, Scanning electron microscopy, 3D metrology, Bridges, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Standards development, 193nm lithography, Defect inspection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Scanning electron microscopy, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, 193nm lithography, Defect inspection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Deep ultraviolet, Calibration, Manufacturing, Image analysis, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 43 publications
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