Dr. Hiroyuki Mizuno
Specialist at Toshiba Corp
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79692H (2011) https://doi.org/10.1117/12.879359
KEYWORDS: Line width roughness, Etching, Ion implantation, Extreme ultraviolet, Ions, Photomasks, Extreme ultraviolet lithography, Dry etching, Semiconducting wafers, Photoresist processing

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013005, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533231
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

Proceedings Article | 27 May 2010 Paper
Proceedings Volume 7748, 774824 (2010) https://doi.org/10.1117/12.868924
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

Proceedings Article | 23 March 2010 Paper
Dave Horak, Tom Wallow, Yunpeng Yin, Susan S.-C. Fan, Bala Haran, Gregory McIntyre, Kevin Cummings, Sudhar Raghunathan, Uzo Okoroanyanwu, Martin Burkhardt, Sander Bouten, John Arnold, Christopher Waskiewicz, Hiroyuki Mizuno, Matthew Colburn, Brian Lee, Yunfei Deng, James H.-C. Chen, Obert Wood, Bart Kessels, Robert Routh, Karen Petrillo, Bill Pierson, Guillaume Landie, Theodorus Standaert, Sean Burns, Chiew-Seng Koay, Jan-Hendrik Peters, Hirohisa Kawasaki, Bruno La Fontaine, Christian Holfeld, Jens Techel
Proceedings Volume 7636, 76361M (2010) https://doi.org/10.1117/12.847049
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Immersion lithography, Double patterning technology, Optical proximity correction, Printing, Lithography, Optical lithography, Metals

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790J (2009) https://doi.org/10.1117/12.824260
KEYWORDS: Photomasks, Scanning electron microscopy, Line edge roughness, Extreme ultraviolet, Atomic force microscopy, Mirrors, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction

Showing 5 of 15 publications
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