Hiroyuki Nagasaka
at Nikon Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Optical lithography, Water, Projection systems, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Semiconducting wafers, Liquids

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Point spread functions, Refractive index, Transparency, Polarization, Birefringence, Control systems, Lens design, Immersion lithography, Surface finishing

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Refractive index, Imaging systems, Water, Manufacturing, Double patterning technology, Immersion lithography, Thin film coatings, Semiconducting wafers, Photoresist developing

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Refractive index, Microfluidics, Polarization, Birefringence, Water, Lens design, Immersion lithography, Semiconducting wafers, Absorption

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Water, Scanners, Particles, Projection systems, Resonance energy transfer, Double patterning technology, Immersion lithography, Semiconducting wafers, Optics manufacturing, Combined lens-mirror systems

Showing 5 of 11 publications
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