Hiroyuki Nakano
at Sony Atsugi Technology Ctr
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconductors, Image processing, Scanning electron microscopy, Signal processing, Inspection equipment, Semiconductor manufacturing, Optical alignment, Computer aided design, Algorithm development, Semiconducting wafers

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Oxides, Lithography, Refractive index, Polarization, Silicon, Reflectivity, Photoresist materials, Immersion lithography, Optimization (mathematics)

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Semiconducting wafers, Plasma treatment, Plasma

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Etching, Copper, Resistance, Inspection, Photomasks, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Back end of line

SPIE Journal Paper | 1 July 2004
JM3 Vol. 3 Issue 03
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

Showing 5 of 12 publications
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