Hiroyuki Shindo
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Inspection, Computer simulations, 3D modeling, Image analysis, Scanning electron microscopy, Image quality, Device simulation

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Surgery, Image segmentation, Image processing, Pattern recognition, Feature extraction, Scanning electron microscopy, Shape analysis, Statistical modeling

Proceedings Article | 28 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Lithography, Metrology, Data modeling, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Model-based design

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metals, Error analysis, Inspection, Distortion, Scanning electron microscopy, Photomasks, Shape analysis, Semiconducting wafers, Overlay metrology, Defect inspection

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Metals, Reliability, Photomasks, Optical proximity correction, Semiconducting wafers, Personal protective equipment

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Metals, Reliability, Scanning electron microscopy, Shape analysis, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Showing 5 of 16 publications
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