Hisanori Sugimachi
Process Engineer at Tokyo Electron Europe Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Etching, Coating, Line width roughness, Double patterning technology, Critical dimension metrology, Neodymium, Photoresist processing, Semiconducting wafers, Factor analysis

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scanning electron microscopy, Printing, Double patterning technology, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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