Hisashi Watanabe
Senior Engineer at Panasonic Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (11)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Thin films, Lithography, Quartz, Printing, Transmittance, Photomasks, Critical dimension metrology, Halftones, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Manufacturing, Inspection, Control systems, Photomasks, Optical proximity correction, Mask making, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Yield improvement, Binary data

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Deep ultraviolet, Reflection, Interfaces, Reflectivity, Control systems, Critical dimension metrology, Photoresist processing, Bottom antireflective coatings, Absorption

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Monochromatic aberrations, Phase shifting, Silicon, Chromium, Image registration, Optical testing, Image quality, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Monochromatic aberrations, Error analysis, Optical simulations, Excimer lasers, Overlay metrology

Showing 5 of 11 publications
Conference Committee Involvement (5)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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