Hitoshi Handa
at Fujitsu Semiconductor Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffractive optical elements, Etching, Chromium, Process control, Photomasks, Line width roughness, Cadmium sulfide, SRAF, Mask making, Photoresist processing

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Sensors, Etching, Chromium, Computer simulations, Oxygen, Process control, Photomasks, Critical dimension metrology, Plasma, Phase shifts

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Sensors, Etching, Error analysis, Resistance, Chromium, Process control, Critical dimension metrology, Signal detection, Plasma

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Thin films, Lithography, Reticles, Etching, Dry etching, Chromium, Control systems, Process control, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | September 5, 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Lithography, Reticles, Contamination, Deep ultraviolet, Quartz, Particles, Ions, Inspection, Chromium, Photomasks

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Etching, Dry etching, Magnetism, Chromium, Wet etching, Critical dimension metrology, Reactive ion etching, Photoresist processing, Chlorine gas

Showing 5 of 10 publications
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