Hitoshi Nakano
Manager at Canon Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Curtains, Dry etching, Ultraviolet radiation, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology, Liquids

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Contamination, Deep ultraviolet, Water, Particles, Inspection, Bridges, Scanning probe microscopy, Semiconducting wafers, Liquids, Defect inspection

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Particles, Inspection, Distortion, Bridges, Scanning probe microscopy, Thin film coatings, Semiconducting wafers, Overlay metrology, Liquids

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Contamination, Water, Particles, Inspection, Control systems, Bridges, Transmittance, Semiconducting wafers, Pulsed laser operation, Defect inspection

Proceedings Article | 11 April 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Quartz, Crystals, Photography, Scanning electron microscopy, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 10 publications
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