Hitoshi Suzuki
at Topcon Corp
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | October 1, 2007
JM3 Vol. 6 Issue 04
KEYWORDS: Cements, Deep ultraviolet, Adhesives, Transmittance, Objectives, Inspection, Microscopes, Fluorine, Lamps, Excimer lasers

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Imaging systems, Lenses, Image processing, Inspection, Image acquisition, Image quality, Image sensors, Photomasks, Integrated optics, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Microscopes, Deep ultraviolet, Silica, Calcium, Inspection, Cements, Objectives, Transmittance, Excimer lasers, Adhesives

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Defect detection, Speckle, Sensors, Image processing, Inspection, Optical inspection, Image sensors, Photomasks, Modulation transfer functions, Algorithm development

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Semiconductors, Electron beams, 3D image reconstruction, Magnetism, Image resolution, 3D metrology, Objectives, Optical simulations, Reconstruction algorithms, 3D image processing

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Electron beams, 3D image reconstruction, Image resolution, 3D metrology, Objectives, Reconstruction algorithms, Algorithm development, Semiconducting wafers, 3D image processing

Showing 5 of 7 publications
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