Dr. Hitoshi Yamato
Chemistry Group Manager R&D at Ciba Specialty Chemicals KK
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 3 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Lithography, Transparency, Polymers, Water, Coating, Chromophores, Photoresist materials, Fluorine, Chemically amplified resists

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Polymers, Coating, Scanning electron microscopy, Photoresist materials, Immersion lithography, Line edge roughness, Absorption, Chemically amplified resists

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Transparency, Contamination, Quartz, Chemical species, Polymers, Hydrogen, Coating, Photoresist materials, Immersion lithography

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Transparency, Polymers, Water, Ultraviolet radiation, Quantum efficiency, Photoresist materials, Immersion lithography, Process modeling, Absorption

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Polymers, Water, Ultraviolet radiation, Photoresist materials, Photomasks, Absorbance, Absorption, Chemically amplified resists

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top