Dr. Hoyong Jung
Inventor at SK Hynix Inc
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Oxides, Deep ultraviolet, Air contamination, Scanners, Chromium, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Quartz, Particles, Image restoration, Chromium, Scanning electron microscopy, Photomasks, Deposition processes, Critical dimension metrology, Phase shifts

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Defect detection, Silica, Quartz, Particles, Light scattering, Surface roughness, Distortion, Photomasks, Critical dimension metrology

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Defect detection, Image processing, Particles, Manufacturing, Inspection, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Defect inspection

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical lithography, Etching, Quartz, Silicon, Emission spectroscopy, Photomasks, Aluminum, Critical dimension metrology, Molybdenum, Plasma

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Particles, Manufacturing, Reliability, Inspection, Chromium, Photomasks, Critical dimension metrology, Optics manufacturing

Showing 5 of 16 publications
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