Dr. Hoa D. Truong
Lithography Engineer at IBM Research - Almaden
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 25 March 2019 Presentation
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Semiconductors, Metals, Electrons, Photoresist materials, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Systems modeling

Proceedings Article | 25 March 2019 Presentation
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Semiconductors, Metals, Manufacturing, Photoresist materials, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Photochemistry, Thermal modeling, Resolution enhancement technologies

SPIE Journal Paper | 28 August 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

SPIE Journal Paper | 23 May 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Extreme ultraviolet, Directed self assembly, Plasma etching, Optical alignment, Critical dimension metrology, Line edge roughness, Nanofabrication

Showing 5 of 37 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top