Dr. Hoa D. Truong
Lithography Engineer at IBM Research - Almaden
SPIE Involvement:
Author
Publications (35)

SPIE Journal Paper | August 28, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

SPIE Journal Paper | May 23, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Extreme ultraviolet, Directed self assembly, Plasma etching, Optical alignment, Critical dimension metrology, Line edge roughness, Nanofabrication

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Polymers, Chemistry, Photoresist materials, Atomic layer deposition, Extreme ultraviolet, Extreme ultraviolet lithography, Head-mounted displays, Photoresist processing, Back end of line

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Etching, Image processing, Silicon, Directed self assembly, Line edge roughness, Neodymium

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Polymethylmethacrylate, Etching, Image segmentation, Composites, Scanning electron microscopy, Photomasks, Directed self assembly, Picosecond phenomena, System on a chip

Showing 5 of 35 publications
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