Hoi-Tou Ng
at National Taiwan Univ
SPIE Involvement:
Publications (6)

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Diffraction, Reflectivity, Polarization, Spectrum analysis, Control systems, Critical dimension metrology, Resolution enhancement technologies

SPIE Journal Paper | 22 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Calibration, Line edge roughness, Scatterometry, Point spread functions, Process modeling, Scanning electron microscopy, Metrology, Scattering, Semiconducting wafers, Cadmium

SPIE Journal Paper | 13 March 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Point spread functions, Calibration, Optical lithography, Lithography, Photoresist processing, Optical simulations, Electron beam lithography, Tolerancing, Scattering, Critical dimension metrology

Proceedings Article | 14 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Sensors, Monte Carlo methods, Electron beams, Signal detection, Lithography, Electron beam lithography, Detector arrays, Optical simulations, Semiconducting wafers, Silicon

Showing 5 of 6 publications
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