Hoi-Tou Ng
at National Taiwan Univ
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Spectrum analysis, Polarization, Reflectivity, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

SPIE Journal Paper | August 22, 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Point spread functions, Metrology, Cadmium, Scattering, Calibration, Scanning electron microscopy, Scatterometry, Line edge roughness, Semiconducting wafers, Process modeling

SPIE Journal Paper | March 13, 2012
JM3 Vol. 11 Issue 1
KEYWORDS: Point spread functions, Calibration, Optical lithography, Lithography, Photoresist processing, Optical simulations, Electron beam lithography, Tolerancing, Scattering, Critical dimension metrology

PROCEEDINGS ARTICLE | December 14, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Sensors, Silicon, Detector arrays, Monte Carlo methods, Optical simulations, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Electron beam lithography, Polymethylmethacrylate, Data modeling, Backscatter, Scattering, Silicon, Laser scattering, Computer simulations, Monte Carlo methods, Direct write lithography

Showing 5 of 6 publications
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