Holger Bald
at Qoniac GmbH
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Electronics, Data modeling, Computer simulations, Information technology, Optical alignment, Neodymium, Semiconducting wafers, Yield improvement, Overlay metrology, Standards development

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Metrology, Statistical analysis, Data modeling, Computer simulations, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling, Data corrections, Overlay metrology

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