Holger B. H. Blaschke
at JENOPTIK Optical Systems GmbH
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 6 December 2011 Paper
Proc. SPIE. 8190, Laser-Induced Damage in Optical Materials: 2011
KEYWORDS: Thin films, Mirrors, Silica, Laser induced damage, Ultraviolet radiation, Resistance, Excimer lasers, Excimers, Laser damage threshold, Deposition processes

Proceedings Article | 28 November 2011 Paper
Proc. SPIE. 8190, Laser-Induced Damage in Optical Materials: 2011
KEYWORDS: Lithography, Polishing, Deep ultraviolet, Silica, Quartz, Spectroscopy, Extreme ultraviolet, Surface finishing, Temperature metrology, Absorption

Proceedings Article | 23 November 2011 Paper
Proc. SPIE. 8190, Laser-Induced Damage in Optical Materials: 2011
KEYWORDS: Oxides, Thin films, Data modeling, Silica, Laser induced damage, Ultraviolet radiation, Data acquisition, Ion beams, Laser damage threshold, Thin film coatings

Proceedings Article | 4 October 2011 Paper
Proc. SPIE. 8168, Advances in Optical Thin Films IV
KEYWORDS: Reflectors, Refractive index, Multilayers, Silica, Laser induced damage, Optical coatings, Transmission electron microscopy, Ion beams, Hybrid fiber optics, Absorption

Proceedings Article | 8 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical components, Mirrors, Spectrographs, Spectroscopy, Silicon, Reflectivity, CCD cameras, Spectral resolution, Extreme ultraviolet, Spectrophotometry

Showing 5 of 38 publications
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