Dr. Holger Glatzel
Manager, Optical Engineering at KLA-Tencor Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (16)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Optical lithography, Cameras, Sensors, Wavefronts, Projection systems, Extreme ultraviolet, Artificial intelligence, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Mirrors, Metrology, Optical coatings, Wavefronts, Optical fabrication, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Mirrors, Multilayers, Metrology, Wavefronts, Optical testing, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | September 15, 2011
Proc. SPIE. 8146, UV/Optical/IR Space Telescopes and Instruments: Innovative Technologies and Concepts V
KEYWORDS: Mirrors, Polishing, Aerospace engineering, Composites, Coating, Manufacturing, Beryllium, James Webb Space Telescope, Cryogenics, Surface finishing

PROCEEDINGS ARTICLE | August 5, 2010
Proc. SPIE. 7731, Space Telescopes and Instrumentation 2010: Optical, Infrared, and Millimeter Wave
KEYWORDS: Mirrors, Polishing, Metrology, Aerospace engineering, Phase modulation, Optical fabrication, Optical testing, Beryllium, James Webb Space Telescope, Surface finishing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Microscopes, Mirrors, Reticles, Polishing, Imaging systems, Optical coatings, Wavefronts, Atomic force microscopy, Extreme ultraviolet, Surface finishing

Showing 5 of 16 publications
Conference Committee Involvement (1)
Advances in Metrology for X-Ray and EUV Optics
2 August 2005 | San Diego, California, United States
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