Dr. Holger Seitz
at SCHOTT Lithotec AG
SPIE Involvement:
Publications (16)

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66073D (2007) https://doi.org/10.1117/12.729032
KEYWORDS: Etching, Dry etching, Extreme ultraviolet lithography, Reflectivity, Photomasks, Inspection, Scanning electron microscopy, Mask making, Electron beam lithography, Manufacturing

Proceedings Article | 21 June 2006 Paper
Uwe Mickan, Rogier Groeneveld, Marcel Demarteau, Jan Hendrik Peters, Uwe Dersch, Günter Hess, Holger Seitz
Proceedings Volume 6281, 628105 (2006) https://doi.org/10.1117/12.692629
KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Etching, Tolerancing, Image processing, Coating, Printing, Lithography, Reflectivity

Proceedings Article | 22 March 2006 Paper
Holger Seitz, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Torsten Reichardt, Ronny Walter, Helmut Popp, Günter Hess, Florian Letzkus, Jörg Butschke, Mathias Irmscher
Proceedings Volume 6151, 615109 (2006) https://doi.org/10.1117/12.655540
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Multilayers, Dry etching, Polishing, Manufacturing, Reflectivity, Coating

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59923U (2005) https://doi.org/10.1117/12.631526
KEYWORDS: Photomasks, Tantalum, Metrology, Optical lithography, Chromium, Interferometers, Image registration, Quartz, Finite element methods, Lithography

Proceedings Article | 4 November 2005 Paper
Hans Becker, Markus Renno, Ulrich Hermanns, Holger Seitz, Ute Buttgereit, Konrad Knapp, Günter Hess
Proceedings Volume 5992, 59920I (2005) https://doi.org/10.1117/12.632113
KEYWORDS: Reflection, Antireflective coatings, Photomasks, Binary data, Inspection, Phase shifts, Interfaces, Etching, Lithography, Opacity

Showing 5 of 16 publications
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