Dr. Holger Seitz
at SCHOTT Lithotec AG
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electron beam lithography, Etching, Dry etching, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Mask making

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Etching, Image processing, Coating, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Tolerancing

PROCEEDINGS ARTICLE | March 22, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Multilayers, Polishing, Etching, Dry etching, Coating, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Metrology, Optical lithography, Interferometers, Quartz, Chromium, Image registration, Finite element methods, Photomasks, Tantalum

PROCEEDINGS ARTICLE | November 4, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Antireflective coatings, Reflection, Opacity, Etching, Interfaces, Inspection, Photomasks, Binary data, Phase shifts

PROCEEDINGS ARTICLE | October 5, 2005
Proc. SPIE. 5963, Advances in Optical Thin Films II
KEYWORDS: Oxides, Lithography, Phase shifting, Reflection, Etching, Dry etching, Inspection, Photomasks, Tantalum, Phase shifts

Showing 5 of 16 publications
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