Laser produced plasma (LPP) light sources for extreme ultraviolet (EUV) lithography currently has been extensively studied. Most of the studies are based on CO<sub>2</sub> laser induced plasma from mass limited tin targets. In this work, a droplet dispenser that produces uniform droplets size of about 150μm was established. A pulsed TEA-CO<sub>2</sub> laser and a Nd: YAG laser irradiated the droplets producing plasma respectively to get EUV emission. An X-ray Spectrometer and EUV photodiodes were used to collect the spectra and EUV radiation. The different EUV spectral composition and angular distribution of EUV emission from plasmas induced by the CO<sub>2</sub> and Nd: YAG laser were studied.