Dr. Hong Zhuang
Senior Research Chemist at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 6 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Signal attenuation, Etching, Reflectivity, Chemical vapor deposition, Control systems, Photomasks, Immersion lithography, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 23 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Silica, Nanoparticles, Etching, Particles, Resistance, Photoresist materials, Deep reactive ion etching, Plasma etching, Nanocomposites, Plasma

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Etching, Polymers, Ions, Gases, Chemistry, Oxygen, Photoresist materials, Reactive ion etching, Semiconducting wafers, Anisotropic etching

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Metals, Copper, Photoresist materials, Solids, Connectors, Plating, Thin film coatings, Photoresist processing, Semiconducting wafers, Photoresist developing

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